Hafnium Oxide Nanoparticles/Nanopowder
Product Properties
Hafnium Oxide (HfO2) nanopowder/nanoparticles (nm & um)
Size | Type | Particle size（nm） | Purity（%） | Specific surface area（m2/g） | Bulk density（g/cm3） | Polymorphs | Color |
nm | JB-HfO2-001 | 80 | 99.95 | 20.45 | 1.28 | subglobular | white |
sub um | JB-HfO2-002 | 1-5um | 99.95 | 5.94 | 2.02 | subglobular | white |
Custom | Acccording to customers requirment. (30-800nm etc) | ||||||
Hafnium Oxide (HfO2) Nanopowder Main Feature
HfO2 is considered a high-k dielectric material, meaning it has a high dielectric constant compared to conventional silicon dioxide (SiO2) used in semiconductor technology. This property is crucial for its application as a gate dielectric in metal-oxide-semiconductor field-effect transistors (MOSFETs) and capacitors, where it allows for the reduction of gate leakage current, enabling further miniaturization of electronic devices without compromising their performance. HfO2 has a melting point of approximately 2750°C (4982°F) and remains stable at high temperatures, making it suitable for applications requiring materials that can withstand extreme heat. Hafnia is chemically inert and resistant to corrosion from acids and bases, contributing to its durability in harsh environments.Besides its use in areas where a high dielectric constant is needed, HfO2 also serves as an excellent electrical insulator in applications requiring high breakdown voltage and low electrical conductivity.
Hafnium Oxide (HfO2) Nanopowder Applications
- Gate Dielectrics in MOSFETs: The high dielectric constant of HfO2 allows it to be used as a gate dielectric material in metal-oxide-semiconductor field-effect transistors (MOSFETs), enabling the reduction of gate leakage current and allowing further miniaturization of electronic devices.
- DRAM Capacitors: In dynamic random-access memory (DRAM) devices, HfO2 is used to fabricate capacitors with high capacitance values in a small footprint, improving memory density and performance.
- Anti-reflective Coatings: Due to its high refractive index and wide bandgap, HfO2 nanopowder is utilized in anti-reflective coatings for optical lenses and other components, enhancing light transmission and reducing glare.
- Protective Coatings: It’s also used in protective coatings to improve the durability and resistance of optical components to environmental factors.
- Waveguides and Lasers: The optical properties of HfO2 make it suitable for use in photonic devices, including waveguides and lasers, where it can help manage light propagation and amplification.
- Protection Against High Temperatures: The thermal stability of HfO2 makes it an excellent choice for thermal barrier coatings in jet engines and gas turbines. These coatings protect components from high-temperature corrosion and oxidation, extending their service life.